• DocumentCode
    503448
  • Title

    Forming of germanium nanoclusters in the films of germanosilicate glass

  • Author

    Kovalevsky, A.A. ; Strogova, A.S. ; Plyakin, D.V.

  • Author_Institution
    Belarusian State Univ. of Inf. & Radioelectron., Minsk, Belarus
  • fYear
    2009
  • fDate
    14-18 Sept. 2009
  • Firstpage
    627
  • Lastpage
    628
  • Abstract
    The results of study of forming of nanoclusters of germanium in the films of Ge-silicate glass (GSG) (SixGeyOz), obtained in the process of oxidization and heat treatment of polycrystalline silicon films alloyed by germanium with the use of atomic power microscopy (APM), are presented.
  • Keywords
    elemental semiconductors; germanate glasses; heat treatment; oxidation; semiconductor thin films; silicon; silicon compounds; APM; SixGeyOz; atomic power microscopy; germanium nanoclusters; germanosilicate glass films; heat treatment; oxidization; polycrystalline silicon films; Germanium alloys; Germanium silicon alloys; Glass; Heat treatment; Microscopy; Organizing; Semiconductor films; Silicon alloys; Silicon germanium; Temperature dependence;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave & Telecommunication Technology, 2009. CriMiCo 2009. 19th International Crimean Conference
  • Conference_Location
    Sevastopol
  • Print_ISBN
    978-1-4244-4796-1
  • Type

    conf

  • Filename
    5292963
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=503448