• DocumentCode
    503472
  • Title

    Investigation of circuit diagram in metal-semiconductor contacts with schottki barrier using the method of atomic force

  • Author

    Bozhkov, V.G. ; Torkhov, N.A. ; Novikov, V.A. ; Ivonin, I.V.

  • Author_Institution
    Sci.- Res. Inst. of Semicond., Tomsk, Russia
  • fYear
    2009
  • fDate
    14-18 Sept. 2009
  • Firstpage
    535
  • Lastpage
    536
  • Abstract
    We have found out that current density distribution areally in a free contact (without a dielectric in circumferential direction) of semiconductor metal (SM) with Schottky barrier (SB) on the submicron level and the nanolevel is very incoherently. In the field of low currents with low tension the shift of the electrical circuit is determined by a narrow area (< 100 nm) in a circumferential direction of a contact. With the growth of tension in the contact we might see involvement of the rest area of the contact in the electrical circuit, in which it is determined by fractal nature of distribution of local (50 nm...200 nm) nonhomogeneities in current density. Conductivity of certain local parts in the contact area significantly differs, which leads to significant loss of efficiency of conductivity of the contact.
  • Keywords
    Schottky barriers; atomic force microscopy; current density; current distribution; network analysis; semiconductor-metal boundaries; Schottky barrier; atomic force method; circuit diagram; current density distribution; metal-semiconductor contacts; nanolevel; submicron level; Circuits; Gold; Helium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave & Telecommunication Technology, 2009. CriMiCo 2009. 19th International Crimean Conference
  • Conference_Location
    Sevastopol
  • Print_ISBN
    978-1-4244-4796-1
  • Type

    conf

  • Filename
    5292991