• DocumentCode
    503637
  • Title

    Thick-electron beam klinoorbotron

  • Author

    Gurevich, A.V. ; Kurayev, A.A. ; Sinitsyn, A.K. ; Yeryomka, V.D.

  • Author_Institution
    Belarusian State Univ. of Inf. & Radioelectron., Minsk, Belarus
  • fYear
    2009
  • fDate
    14-18 Sept. 2009
  • Firstpage
    173
  • Lastpage
    175
  • Abstract
    On the basis of developed program considering deposition of current on the slow-wave structure (SWS) the optimal parameters of a 3-mm wave orbotron and klinoorbotron operating at voltage of an electron beam of 3-kV have been calculated. The stratification effect of a beam in orbotron has been studied. It has been shown that the use of klinotron effect results in efficient compensation of stratification.
  • Keywords
    electron beams; microwave generation; millimetre wave generation; slow-wave structure; thick-electron beam klinoorbotron; voltage 3 kV; wave orbotron; wavelength 3 mm; Electrons; Helium; IEEE catalog; Indium tin oxide; Organizing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave & Telecommunication Technology, 2009. CriMiCo 2009. 19th International Crimean Conference
  • Conference_Location
    Sevastopol
  • Print_ISBN
    978-1-4244-4796-1
  • Type

    conf

  • Filename
    5293179
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=503637