DocumentCode :
503728
Title :
Comparison of 24 GHz low-noise mixers in CMOS and SiGe:C technologies
Author :
Issakov, Vadim ; Knapp, Herbert ; Tiebout, Marc ; Thiede, Andreas ; Simbürger, Werner ; Maurer, Linus
Author_Institution :
Dept. of High-Freq. Electron., Univ. of Paderborn, Paderborn, Germany
fYear :
2009
fDate :
28-29 Sept. 2009
Firstpage :
184
Lastpage :
187
Abstract :
This paper presents a comparison of two low-noise mixers designed in Infineon´s 0.13 mum CMOS and 0.35 mum SiGe:C processes. The mixers have been optimized for low-noise performance for narrow-band 24 GHz applications. Both circuits are based on the Gilbert cell and have similar topology. The chips are designed to fulfill high robustness requirements for industrial and automotive applications. The CMOS mixer provides a conversion gain of 7 dB and a double-sideband (DSB) noise figure of 7.5 dB . To the authors´ knowledge, this is the lowest reported to date CMOS noise-figure in this frequency range. The SiGe mixer offers a higher gain of 10.5 dB and a lower DSB noise figure of 4.7 dB . Furthermore, it has better linearity of -7.2 dBm compared to -12 dBm input-referred 1dB compression point, measured for the CMOS circuit. The CMOS and SiGe circuits consume 2.8 mA from 1.5 V and 12 mA from a 3.3 V supply, respectively. Performance variation of key parameters has been analyzed in measurement over a wide range of temperatures from -40degC to 12 degC. The SiGe chip offers better performance stability over temperature.
Keywords :
CMOS integrated circuits; Ge-Si alloys; MMIC mixers; field effect MMIC; integrated circuit noise; network topology; CMOS technology; Gilbert cell; Infineon; SiGe:C; circuit topology; current 12 mA; current 2.8 mA; frequency 24 GHz; gain 10.5 dB; gain 7 dB; low-noise mixer; narrow-band mixer; noise figure 4.7 dB; noise figure 7.5 dB; size 0.13 mum; size 0.35 mum; temperature -40 C to 125 C; voltage 1.5 V; voltage 3.3 V; CMOS process; CMOS technology; Circuits; Gain; Germanium silicon alloys; Mixers; Narrowband; Noise figure; Semiconductor device measurement; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Integrated Circuits Conference, 2009. EuMIC 2009. European
Conference_Location :
Rome
Print_ISBN :
978-1-4244-4749-7
Type :
conf
Filename :
5295923
Link To Document :
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