• DocumentCode
    503804
  • Title

    A model for the critical voltage for electrical degradation of GaN high electron mobility transistors

  • Author

    Joh, Jungwoo ; Gao, Feng ; Palacios, Tomás ; del Alamo, Jesús A.

  • Author_Institution
    Massachusetts Inst. of Technol., Cambridge, MA, USA
  • fYear
    2009
  • fDate
    11-11 Oct. 2009
  • Firstpage
    3
  • Lastpage
    6
  • Abstract
    It has recently been postulated that GaN high electron mobility transistors under high voltage stress degrade as a result of defect formation induced by excessive mechanical stress that is introduced through the inverse piezoelectric effect. This mechanism is characterized by a critical voltage beyond which irreversible degradation takes place. We have built a first-order model for the critical voltage for degradation of GaN HEMTs. In our model, electrical degradation occurs when the elastic energy stored in the AlGaN barrier exceeds a critical value. When using estimations of this critical elastic energy that come from epitaxial studies of strain relaxation in Al-GaN/GaN heterostructures, our proposed model yields predictions for the critical voltage that match experimental observations.
  • Keywords
    gallium compounds; high electron mobility transistors; GaN; critical voltage; electrical degradation; high electron mobility transistors; inverse piezoelectric effect; Aluminum gallium nitride; Degradation; Gallium nitride; HEMTs; MODFETs; Piezoelectric effect; Semiconductor process modeling; Stress; Voltage; Yield estimation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability of Compound Semiconductors Digest (ROCS), 2009
  • Conference_Location
    Greensboro, NC
  • Print_ISBN
    978-0-7908-0124-7
  • Type

    conf

  • Filename
    5313993