Improvement of impedance matching between NS pulse geberator and discharge reactor

During the decades, the development of high power semiconductor switches and magnetic cores have allowed us manufacturing pulsed power sources with high energy transfer efficiency. As the results, the pulsed discharge has been recognized as one of the promised non-thermal plasma techniques for practical use. However, the energy transfer efficiency of pulsed discharge system is approximately 30% although in the best condition. In the practical process of its applications, higher energy efficiency is required. In this study, the reason why the conventional pulsed discharge system had stayed in low energy transfer efficiency was described. Furthermore, performance of the "nanoseconds pulsed generator" (ns pulse generator) was presented with higher energy transfer efficiency and its applications of exhaust gas treatment experiments. As the results, the energy transfer efficiency of up to 62 % was achieved by improving the impedance matching between ns pulse generator and discharge reactor. In the exhaust gas treatment experiment, NO removal ratio of 100 % (initial NO concentration - 200 ppm) and improvement of NO removal energy efficiency were obtained.