Title :
An Assessment of the Bias Dependence of Displacement Damage Effects and Annealing in Silicon Charge Coupled Devices
Author :
Robbins, Mark S. ; Gomez Rojas, Luis
Author_Institution :
Surrey Satellite Technol. Ltd., Sevenoaks, UK
Abstract :
The dependence of displacement damage effects in silicon charge coupled devices on the bias conditions during proton irradiation has been assessed. The devices have been fully characterized for dark signal increase, charge transfer degradation and the generation of random telegraph signals. A 5 to 10% higher degradation rate for all these parameters has been seen when unbiased during irradiation, under conditions typically used for a proton irradiation campaign, compared with the case when operating the devices during the irradiation. Room temperature annealing has been investigated and shows a bias dependence for all parameters tested. A reverse annealing behavior of bulk dark signal and random telegraph signals following illumination is reported for the first time. Both the annealing and reverse annealing observations may, in part, be attributed to the behavior of the trivacancy.
Keywords :
annealing; charge-coupled devices; elemental semiconductors; radiation hardening (electronics); silicon; Si; bias conditions; bias dependence assessment; bulk dark signal; charge transfer degradation; displacement damage effects; proton irradiation campaign; random telegraph signal generation; reverse annealing behavior; room temperature annealing; silicon charge coupled devices; temperature 293 K to 298 K; Annealing; Charge coupled devices; Dark current; Degradation; Radiation effects; Annealing; CCD image sensors; RTS; charge transfer efficiency; dark current; dark signal; displacement damage; radiation damage; random telegraph signals;
Journal_Title :
Nuclear Science, IEEE Transactions on
DOI :
10.1109/TNS.2013.2287255