Title :
Photoresist films patterning at 355 nm
Author :
Damian, V. ; Apostol, Ileana ; Müller, Raluca ; Eftime, Laura
Author_Institution :
Nat. Inst. for Laser, Plasma & Radiat. Phys., Magurele, Romania
Abstract :
Processing at submicron level of the photoresists materials by direct writing method are investigated because of their applications in optoelectronics and bio-science. We have obtained surface relief gratings in single step processing on photoresists with possibility to control the modulation depth from 19 nm to 1 mum.
Keywords :
nanopatterning; optoelectronic devices; photoresists; bio-science; direct writing method; nanopatterning; optoelectronics; photoresist films; surface relief gratings; wavelength 355 nm; Biological materials; Diffraction gratings; Interference; Laser beams; Lithography; Microelectronics; Optical materials; Optical surface waves; Resists; Surface emitting lasers; UVlaser; diffraction; direct laser patterning; interferometry; lithography;
Conference_Titel :
Semiconductor Conference, 2009. CAS 2009. International
Conference_Location :
Sinaia
Print_ISBN :
978-1-4244-4413-7
DOI :
10.1109/SMICND.2009.5336556
