DocumentCode :
505507
Title :
Spatial and temporal temperature variations in CMOS designs
Author :
Janssen, J.H.J. ; Veendrick, H.J.M.
Author_Institution :
NXP Semicond., Nijmegen, Netherlands
fYear :
2009
fDate :
7-9 Oct. 2009
Firstpage :
31
Lastpage :
35
Abstract :
Due to the rapid growth in the number of transistors per chip, the power consumption of the average nMOS ASIC reached the level of one Watt, which is, in order of magnitude, about the maximum power consumption allowed for a cheap plastic package without thermal enhancements like drop-in heat spreader, fused leads or exposed pads. The internal chip temperature is the result of the combination of the chip power, the package, a possible heatsink, the application board and the airflow conditions. This requires a reasonably accurate model that includes the thermal properties of the chip, the bonds, the package and the system.
Keywords :
CMOS integrated circuits; integrated circuit design; power consumption; CMOS designs; internal chip temperature; power consumption; spatial and temporal temperature variations; CMOS technology; Energy consumption; Integrated circuit packaging; Integrated circuit technology; Land surface temperature; Logic circuits; Logic gates; MOS devices; Stress; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermal Investigations of ICs and Systems, 2009. THERMINIC 2009. 15th International Workshop on
Conference_Location :
Leuven
Print_ISBN :
978-1-4244-5881-3
Type :
conf
Filename :
5340084
Link To Document :
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