Title :
Fabrication of optofluidic systems using isotropic wet etched masters in ‹111› silicon wafer
Author :
Liu Neng ; Li Ming-yu ; Kou Qing-li ; He Jian-jun
Author_Institution :
State Key Lab. for Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
fDate :
Oct. 30 2008-Nov. 2 2008
Abstract :
Low roughness relief structures have been fabricated using wet etching in <111> silicon wafer for use as masters for microfluidic systems. The etch rate is about 1 to 3 mm/min. A surface roughness of about 2 nm was measured by the atomic force microscope (AFM). No distortion or variation on the channel width is observed in the circular and Y-branched relief structures.
Keywords :
atomic force microscopy; etching; micro-optomechanical devices; microfabrication; microfluidics; optical fabrication; surface topography measurement; Si; Y-branched structure; atomic force microscope; circular relief structure; isotropic wet etched masters; microfluidic system; optofluidic system fabrication; silicon wafer substrate; size 2 nm; surface roughness measurement; Atomic force microscopy; Atomic measurements; Distortion measurement; Fabrication; Force measurement; Microfluidics; Rough surfaces; Silicon; Surface roughness; Wet etching;
Conference_Titel :
Optical Fiber Communication & Optoelectronic Exposition & Conference, 2008. AOE 2008. Asia
Conference_Location :
Shanghai
Print_ISBN :
978-1-55752-863-6
Electronic_ISBN :
978-1-55752-863-6
