• DocumentCode
    505856
  • Title

    An ultra-compact polarization insensitive directional coupler

  • Author

    Shi, Y. ; Anand, S. ; He, S.

  • Author_Institution
    Joint Res. Center of Photonics, R. Inst. of Technol., Stockholm, Sweden
  • fYear
    2008
  • fDate
    Oct. 30 2008-Nov. 2 2008
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    We investigate the lag-effect in the dry etching process. In one etch step, asymmetric waveguides with a shallow groove in between can be fabricated. This special property can be utilized for the design of an ultra-compact polarization insensitive directional coupler.
  • Keywords
    light polarisation; optical design techniques; optical directional couplers; optical fabrication; sputter etching; ICP-RIE dry etching process; lag-effect; photonic integrated circuits; shallow groove; ultra-compact polarization insensitive directional coupler design; Directional couplers; Dry etching; Epitaxial growth; Indium phosphide; Optical materials; Optical modulation; Optical polarization; Optical waveguides; Scanning electron microscopy; Waveguide discontinuities;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Fiber Communication & Optoelectronic Exposition & Conference, 2008. AOE 2008. Asia
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-55752-863-6
  • Electronic_ISBN
    978-1-55752-863-6
  • Type

    conf

  • Filename
    5348682
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=505856