DocumentCode :
50664
Title :
Low Specific Contact Resistivity to n-Ge and Well-Behaved Ge {\\rm n}^{+}/{\\rm p} Diode Achieved by Multiple Implantation and Multiple Annealing Technique
Author :
Zhiqiang Li ; Xia An ; Quanxin Yun ; Meng Lin ; Min Li ; Ming Li ; Xing Zhang ; Ru Huang
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Volume :
34
Issue :
9
fYear :
2013
fDate :
Sept. 2013
Firstpage :
1097
Lastpage :
1099
Abstract :
In this letter, the specific contact resistivity of metal on n-doped germanium is significantly reduced to 3.8×10-7 Ω·cm2 by P+ multiple implantation and multiple annealing (MIMA) technique. The dramatic reduction of specific contact resistivity is attributed to the enhanced activation of n-type dopants, and a high electrical activation over 1×1020 cm-3 is demonstrated by the spreading resistance profiling analysis. In addition, the fabricated germanium n+/p diode by P+ MIMA technique exhibits an ION/IOFF ratio over 105 with low ideality factor of 1.11. The low specific contact resistivity of metal on n-doped germanium and well-behaved germanium n+/p diode are beneficial for the performance improvement of Ge nMOSFETs.
Keywords :
MOSFET; annealing; contact resistance; germanium; ion implantation; semiconductor diodes; semiconductor doping; P+ MIMA technique; P+ multiple implantation; dramatic reduction; electrical activation; enhanced activation; fabricated germanium; germanium n+/p diode; germanium nMOSFET; ideality factor; multiple annealing technique; n-doped germanium; n-type dopants; resistance profiling analysis; specific contact resistivity; Annealing; Conductivity; Contacts; Germanium; MOSFET; Resistance; Contact resistivity; dopant activation; germanium; junction;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2272641
Filename :
6564419
Link To Document :
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