• DocumentCode
    507472
  • Title

    Pre-ATPG path selection for near optimal post-ATPG process space coverage

  • Author

    Jiniun Xionq ; Shi, Yiyu ; Zolotov, Vladimir ; Visweswariah, Chandu

  • Author_Institution
    Res. Center, IBM, Yorktown Heights, NY, USA
  • fYear
    2009
  • fDate
    2-5 Nov. 2009
  • Firstpage
    89
  • Lastpage
    96
  • Abstract
    Path delay testing is becoming increasingly important for high-performance chip testing in the presence of process variation. To guarantee full process space coverage, the ensemble of critical paths of all chips irrespective of their manufacturing process conditions needs to be tested, as different chips may have different critical paths. Existing coverage-based path selection techniques, however, suffer from the loss of coverage after ATPG (automatic test pattern generation), i.e., although the pre-ATPG path selection achieves good coverage, after ATPG, the coverage can be severely reduced as many paths turn out to be unsensitizable. This paper presents a novel path selection algorithm that, without running ATPG, selects a set of n paths to achieve near optimal post-ATPG coverage. Details of the algorithm and its optimality conditions are discussed. Experimental results show that, compared to the state-of-the-art, the proposed algorithm achieves not only superior post-ATPG coverage, but also significant runtime speedup.
  • Keywords
    automatic test pattern generation; delays; integrated circuit testing; automatic test pattern generation; critical paths; optimal post ATPG process space coverage; path delay testing; path selection algorithm; pre-ATPG path selection; Algorithm design and analysis; Automatic test pattern generation; Circuit faults; Circuit testing; Delay; Manufacturing processes; Permission; Space technology; System testing; Timing; Optimality; Path Selection; Process Space Coverage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computer-Aided Design - Digest of Technical Papers, 2009. ICCAD 2009. IEEE/ACM International Conference on
  • Conference_Location
    San Jose, CA
  • ISSN
    1092-3152
  • Print_ISBN
    978-1-60558-800-1
  • Electronic_ISBN
    1092-3152
  • Type

    conf

  • Filename
    5361310