MHD-simulation of an ICP torch for deposition applications

Plasma torches are widely used for deposition processes. Optimum burner design and operation conditions help to save large amount of energy and environmental pollution. This can be considerably supported by modeling. A coupled 3D MHD-simulation of an inductively coupled plasma torch and the deposition process of SiO₂ on a moving target has been performed. The steady-state continuity, momentum and enthalpy equations are solved assuming local thermal and chemical equilibrium (LTE) and laminar flow. The energy coupling to the plasma accomplished through the electromagnetic field of an induction coil and the radiation losses from the plasma are accounted for in the discretized fluid enthalpy equation as source terms. For all species considered in the system a transport equation is solved. The surface reaction governing the deposition process provides a boundary condition for the species mass fractions in the fluid. The model developed supplies information about the temperature and velocity distribution of the fluid components and the deposition rate on the target surface for complex real geometries.