DocumentCode :
511386
Title :
Fabrication of memristors with poly-crystalline silicon nanowires
Author :
Jamaa, M. Haykel Ben ; Carrara, Sandro ; Georgiou, Julius ; Archontas, Nikolaos ; De Micheli, Giovanni
Author_Institution :
Swiss Fed. Inst. of Technol., EPFL, Lausanne, Switzerland
fYear :
2009
fDate :
26-30 July 2009
Firstpage :
152
Lastpage :
154
Abstract :
Memristors are the two-terminal components that complete the symmetry between the fundamental circuit variables, and they are highly suitable for bioinspired and neural-network-based computational systems due to their inherent memory effect. In this paper we present a fabrication technique that uses only Complementary Metal Oxide Semiconductor (CMOS) processing steps and conventional photolithography, yielding poly-crystalline silicon nanowires that show a memristive behavior. Besides measurements, we performed numerical device simulations that address the observed memristive effect.
Keywords :
elemental semiconductors; field effect transistors; memristors; nanoelectronics; nanowires; photolithography; silicon; Si; ambipolar hysteretic behavior; complementary metal oxide semiconductor processing; memristive effect; memristors; numerical device simulations; photolithography; poly-SiNW field effect transistors; poly-crystalline silicon nanowires; two-terminal components; CMOS process; Circuits; Computational modeling; Fabrication; Lithography; Memristors; Nanowires; Numerical simulation; Performance evaluation; Silicon; SiNWFET; ambipolar; charge trapping; hysterisis; memristor; poly-Si; polycrystalline silicon; silicon nanowire; spacer technique;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2009. IEEE-NANO 2009. 9th IEEE Conference on
Conference_Location :
Genoa
ISSN :
1944-9399
Print_ISBN :
978-1-4244-4832-6
Electronic_ISBN :
1944-9399
Type :
conf
Filename :
5394577
Link To Document :
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