DocumentCode
511417
Title
Fabrication of asymmetric micro- and nanostructure based on stepwise angle-resolved colloidal lithography
Author
Zhang, Gang ; Gan, Lin ; Yang, Bai ; Wang, Dayang ; Mohwald, H.
Author_Institution
State Key Lab. of Supramolecular Struct. & Mater., Jilin Univ., Changchun, China
fYear
2009
fDate
26-30 July 2009
Firstpage
277
Lastpage
279
Abstract
Due to the process simplicity, the low cost, and the accessibility of scaling down the feature size, colloidal lithography has drawn a great deal of attention once being developed. In this work we succeeded in fabricating asymmetric heterogeneous arrays of metallic NPs and asymmetric nanoshells via stepwise angle-resolved colloidal lithography. The present approach is independent of the sphere sizes of colloidal masks and the chemical nature of materials deposited, while it shows a profound dependence on the registry of colloidal masks with respect to the incidence vapor beam and the incidence angle. Such asymmetric heterogeneous arrays and asymmetric nanoshells are hard to construct by otherwise lithographic techniques.
Keywords
colloidal crystals; gold; nanofabrication; nanolithography; nanoparticles; silver; vapour deposition; Ag; Au; asymmetric microstructure; asymmetric nanoshells; colloidal masks; incidence angle; incidence vapor beam; metallic nanoparticles; nanofabrication; nanostructure; stepwise angle-resolved colloidal lithography; Chemicals; Colloidal crystals; Colloidal lithography; Etching; Fabrication; Gold; Nanobioscience; Nanoparticles; Nanostructured materials; Plasma applications; asymmetric; colloidal lithography; stepwise Angle-resolved;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2009. IEEE-NANO 2009. 9th IEEE Conference on
Conference_Location
Genoa
ISSN
1944-9399
Print_ISBN
978-1-4244-4832-6
Electronic_ISBN
1944-9399
Type
conf
Filename
5394608
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