Advances in the pulsed laser deposition of rare earth — Doped LiYF4 thin films on LiYF4 substrates

Author

Anwar-ul-Haq, M. ; Barsanti, S. ; Bicchi, P.

Author_Institution

Dept. of Phys., Univ. of Siena, Siena, Italy

fYear

2009

fDate

26-30 July 2009

Firstpage

313

Lastpage

316

Abstract

The influence of several experimental ablation/deposition parameters on the pulsed laser deposition on mono-crystalline LiYF₄ substrates of Nd³⁺:LiYF₄ thin films with suitable characteristics for their use as active medium in microlasers is investigated. The very first realization with the same technique of a Tm³⁺:LiYF₄ thin film on mono-crystalline LiYF₄ substrate is reported together with the first spectroscopic analysis of its optical properties.

Keywords

doping; fluorescence; lithium compounds; neodymium; pulsed laser deposition; solid lasers; thin films; thulium; yttrium compounds; LiYF₄:Nd³⁺; LiYF₄:Tm³⁺; ablation parameters; active medium; deposition parameters; microlasers; optical properties; pulsed laser deposition; rare earth-doped thin film; spectroscopic analysis; Crystallization; Fluorescence; Gas lasers; Laser ablation; Optical films; Optical pulses; Pulsed laser deposition; Sputtering; Substrates; Temperature; Pulsed laser deposition; fluoride crystals; thin films;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology, 2009. IEEE-NANO 2009. 9th IEEE Conference on

Conference_Location

Genoa

ISSN

1944-9399

Print_ISBN

978-1-4244-4832-6

Electronic_ISBN

1944-9399

Type

conf

Filename

5394629