• DocumentCode
    511491
  • Title

    Controllable fabrication of carbon nanotubes on catalystic nanoparticles derived from block copolymer micelles

  • Author

    Xu, Peng ; Ji, Xin ; Jiang, Shimei ; Qi, Junlei ; Yang, Hongmin ; Zheng, Weitao ; Abetz, Volker

  • Author_Institution
    State Key Lab. of Supramolecular Struct. & Mater., Jilin Univ., Changchun, China
  • fYear
    2009
  • fDate
    26-30 July 2009
  • Firstpage
    835
  • Lastpage
    837
  • Abstract
    Micellles of poly(cyclohexyl metharylate)-block-poly(2-vinylpyridine) (PCMA-b-P2VP) block copolymer in methanol were used as nanoreactors to fabricate FeCl3 nanoparticles. Then the FeCl3-loaded micelles solution was used as an ink to print films with polydimethylsiloxane (PDMS) stamps, different morphologies of the FeCl3-loaded micellar films were left onto silicon substrates after printed. After removing the polymer by thermal decomposition, the left iron oxide cluster arrays on the substrate were used as catalysts for the growth of CNTs by the process of PECVD, where the CNTs uniformly distributed on the substrates according to the morphologies of patterned catalysts arrays. Moreover, with a pre-coating of aluminum oxide (Al2O3) layer onto silicon wafers, CNTs grew vertically onto the substrates with the catalyst nanoparticles, forming aligned and patterned structures.
  • Keywords
    aluminium compounds; carbon nanotubes; colloids; iron compounds; nanoparticles; organic compounds; plasma CVD; polymer blends; silicon; Al2O3; C; FeCl3; PCMA-b-P2VP; PECVD; Si; aluminum oxide; block copolymer micelles; carbon nanotubes; catalystic nanoparticles; methanol; poly(cyclohexyl metharylate)-block-poly(2-vinylpyridine); polydimethylsiloxane stamps; silicon substrates; Carbon nanotubes; Fabrication; Ink; Methanol; Morphology; Nanoparticles; Polymers; Semiconductor films; Silicon; Thermal decomposition; PECVD; block copolymer; micelle;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2009. IEEE-NANO 2009. 9th IEEE Conference on
  • Conference_Location
    Genoa
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4244-4832-6
  • Electronic_ISBN
    1944-9399
  • Type

    conf

  • Filename
    5394683