DocumentCode :
511943
Title :
Fabrication and characterization of 1.3-µm InAs quantum-dot VCSELs and monolithic VCSEL arrays
Author :
Ding, Y. ; Fan, W.J. ; Xu, D.W. ; Zhao, L.J. ; Liu, Y. ; Zhu, N.H.
Author_Institution :
School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, Republic of Singapore
Volume :
2009-Supplement
fYear :
2009
fDate :
2-6 Nov. 2009
Firstpage :
1
Lastpage :
7
Abstract :
We present fabrication and characterization of 1.3-µm InAs quantum dot (QD) vertical cavity surface emitting lasers (VCSELs) and QD-VCSEL arrays. The continuous-wave (CW) output power of single QD-VCSEL of 1.2 mW with lasing wavelength of 1.28 µm is obtained at room temperature (RT) at a bias current of 15 mA without power saturation. The low threshold current of 1.1 mA can be achieved for the single mode device. We investigate the 3-dB modulation bandwidth of QD-VCSELs with oxide aperture size of 5-µm, 10-µm and 15-µm in the small signal frequency response measurements. Modulation bandwidth of 2.65 GHz is achieved for single-mode QD-VCSEL with oxide aperture size of 5 µm at a bias current of 4.5 mA. The maximum modulation bandwidth of 2.5 GHz can be obtained for multimode QD-VCSEL with oxide aperture size of 10 µm at a bias current of 7 mA. The 61 QD-VCSELs array is also investigated at RT without optimization. Maximum CW output power of 28 mW and pulsed output power of 18 mW are demonstrated for 2-D QD-VCSEL array with threshold current of 50 mA. The far field pattern beam angle of QD-VCSEL arrays at two perpendicular directions are about 18 degree.
Keywords :
Apertures; Bandwidth; Optical arrays; Optical device fabrication; Power generation; Quantum dot lasers; Quantum dots; Surface emitting lasers; Threshold current; Vertical cavity surface emitting lasers; array; far field; modulation bandwidth; output power; quantum dot (QD); threshold current; vertical cavity surface emitting lasers (VCSELs);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Communications and Photonics Conference and Exhibition (ACP), 2009 Asia
Conference_Location :
Shanghai, China
Print_ISBN :
978-1-55752-877-3
Electronic_ISBN :
978-1-55752-877-3
Type :
conf
Filename :
5405189
Link To Document :
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