• DocumentCode
    512242
  • Title

    Silicon-wires and compact multi-mode interference splitters with an uneven splitting-ratio

  • Author

    Zhou, Jingtao ; Shen, Huajun ; Zhang, Huihui ; Liu, Xinyu

  • Author_Institution
    Institute of Microelectronics of Chinese Academy of Sciences 3 Beitucheng West Road, Chaoyang District, Beijing, China
  • Volume
    2009-Supplement
  • fYear
    2009
  • fDate
    2-6 Nov. 2009
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    We report the fabrication and accurate measurement of propagation and bending losses in silicon wires with submicron dimensions fabricated on silicon-on-insulator wafer. Propagation loss of 0.71±0.03dB/mm for the TE polarization was measured at the 1.55µm. Loss of per 90° bend is measured to be 0.01dB for a bending radius of 5µm. Three types of compact MMI splitters with different splitting-ratios were fabricated and measured. The splitting-ratios are respectively 50∶50, 15∶85 and 28∶72. They exhibited low excess losses of about 1.5∼3.9dB. The splitting-ratios were consistent with the design values.
  • Keywords
    Couplers; Etching; Gratings; Interference; Lithography; Loss measurement; Optical scattering; Propagation losses; Silicon; Wires; MMI; Silicon-wires; uneven splitting-ratio;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Communications and Photonics Conference and Exhibition (ACP), 2009 Asia
  • Conference_Location
    Shanghai, China
  • Print_ISBN
    978-1-55752-877-3
  • Electronic_ISBN
    978-1-55752-877-3
  • Type

    conf

  • Filename
    5405518