Title :
Parallel fabrication of photonic crystals (PC) using interference lithography for integrated waveguide-PC devices
Author :
Chincholi, A. ; Banerjee, S. ; Huang, J.S. ; Klotzkin, D.
Author_Institution :
Univ. Of Cincinnati, Cincinnati, OH, USA
Abstract :
Multiple exposure interference lithography is a promising way to fabricate areas of photonic crystals areas lithographically mapped for easy integration with conventional waveguides or optical devices. Preliminary results on fabrication of square PCs are reported.
Keywords :
optical fabrication; photolithography; photonic crystals; integrated waveguide-PC devices; multiple exposure interference lithography; optical devices; parallel fabrication; photonic crystals; Interference; Lithography; Mirrors; Optical device fabrication; Optical interferometry; Optical waveguide theory; Optical waveguides; Personal communication networks; Photonic crystals; Resists;
Conference_Titel :
Information Photonics, 2005. IP 2005. OSA Topical Meeting on
Conference_Location :
Charlotte, NC
Print_ISBN :
978-1-4244-6637-5
