DocumentCode
51316
Title
Luminescence Enhancement in Amorphous AlN:W by Co-Doped Gd+3
Author
Maqbool, Muhammad ; Ali, Ghafar ; Ahmad, Iftikhar ; Maaz, Khan
Author_Institution
Ball State Univ., Muncie, IN, USA
Volume
27
Issue
14
fYear
2015
fDate
July15, 15 2015
Firstpage
1519
Lastpage
1522
Abstract
Thin films of amorphous AlN:W are deposited on Si(111) substrates by RF magnetron sputtering at liquid nitrogen temperature. The deposited films are characterized for their luminescence properties using cathodoluminescence. A very broad luminescence from tungsten is observed with a relatively more intense peak at 491 nm and less intense at 429 nm. The addition of gadolinium enhanced the bluish-green emission from W+3 more than six times. The cause for enhanced luminescence is the ultraviolet radiative energy transfer and not the electronic transition from Gd+3 to W+3. The addition of Gd+3 dopant also shuffled the energy levels of W+3 and red shift is observed in the tungsten emission. The spectroscopy and ultraviolet light emission from Gd+3 play important role in the enhanced luminescence from AlN:W.
Keywords
III-V semiconductors; aluminium compounds; amorphous semiconductors; cathodoluminescence; energy states; gadolinium; phosphors; photoluminescence; red shift; semiconductor doping; semiconductor growth; semiconductor thin films; sputter deposition; tungsten; AlN:W,Gd; RF magnetron sputtering; amorphous thin films; bluish-green emission; cathodoluminescence; energy levels; liquid nitrogen temperature; luminescence enhancement; red shift is; ultraviolet light emission; ultraviolet radiative energy transfer; wavelength 491 nm; Aluminum nitride; Energy exchange; Films; Ions; Luminescence; Tungsten; Cathodoluminescence; III-V semiconductor materials; Photoluminescence; Thin films; cathodoluminescence; thin films;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/LPT.2015.2427515
Filename
7100858
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