DocumentCode :
513658
Title :
Analyses of Sub 1/4-Micron MOS-Transistors by Visible Light Emission
Author :
Muller, J. ; Wirth, G. ; Hilleringmann, U. ; Goser, K.
Author_Institution :
Dortmund University, ET-BE, 44221 Dortmund, Germany
fYear :
1996
fDate :
9-11 Sept. 1996
Firstpage :
947
Lastpage :
950
Abstract :
As the scaling down of the transistor geometries continuously goes on, basic characterization techniques for the next device generations, especially for device geometries below 0.1¿m, are highly recommended [1]. One interesting tool for this research is the light emission from MOS-transistors operating in deep saturation modes [2][4]. The results of these analyses give new hints for the understanding and fabrication of devices with channel lengths below 0.1¿m.
Keywords :
Current measurement; Electric variables measurement; Electrons; Geometry; Length measurement; Optical saturation; Optical scattering; Stimulated emission; Threshold voltage; Wavelength measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1996. ESSDERC '96. Proceedings of the 26th European
Conference_Location :
Bologna, Italy
Print_ISBN :
286332196X
Type :
conf
Filename :
5435902
Link To Document :
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