DocumentCode
513663
Title
Recent Advances and Trends in SOI CMOS Technology
Author
Colinge, Jean-Pierre
Author_Institution
Université catholique de Louvain, Microelectronics Laboratory, Place du Levant 3, 1348 Louvain-la-Neuve, Belgium
fYear
1996
fDate
9-11 Sept. 1996
Firstpage
935
Lastpage
942
Abstract
Fully depleted SOI CMOS technology is now showing decisive advantages (in contrast to incremental advantages) over bulk CMOS. Low-voltage (as low as 0.5 V), low-power (in the tens of nanowatts range) circuits operating at respectable speeds have been demonstrated. In the DRAM field, a three-fold reduction of the storage capacitor can be obtained, owing to the lower bit line capacitance, the lower access transistor leakage current and the higher soft-error immunity provided by SOI technology. High-temperature analog and digital circuits benefit from the reduced leakage current and the absence of leakage to the substrate found in SOI devices.
Keywords
CMOS analog integrated circuits; CMOS digital integrated circuits; CMOS process; CMOS technology; Capacitance; Digital circuits; Image storage; Leakage current; Transistors; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1996. ESSDERC '96. Proceedings of the 26th European
Conference_Location
Bologna, Italy
Print_ISBN
286332196X
Type
conf
Filename
5435908
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