DocumentCode :
513719
Title :
Monte Carlo Simulation of Electron Transport in Si: The First 20 Years
Author :
Fischetti, M.V. ; Laux, S.E.
Author_Institution :
IBM Research Division, Thomas J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598, USA
fYear :
1996
fDate :
9-11 Sept. 1996
Firstpage :
813
Lastpage :
820
Abstract :
Twenty years after the first application of the Monte Carlo method to the study of electron transport in Si, we discuss the evolution of the physical models employed, from the early parabolic-band models of the mid-1970s to the ab-initio full-band simulations of the 1990s. We note that only recently we have reached a satisfactory understanding of the basic scattering mechanisms at high energy. We sketch the reasons for this embarrassing delay, and present the new `standard model´ arising from this recent progress.
Keywords :
Delay; Electrons; Impact ionization; Irrigation; Kinetic energy; Microscopy; Monte Carlo methods; Phonons; Scattering; Uncertainty;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1996. ESSDERC '96. Proceedings of the 26th European
Conference_Location :
Bologna, Italy
Print_ISBN :
286332196X
Type :
conf
Filename :
5435986
Link To Document :
بازگشت