• DocumentCode
    513719
  • Title

    Monte Carlo Simulation of Electron Transport in Si: The First 20 Years

  • Author

    Fischetti, M.V. ; Laux, S.E.

  • Author_Institution
    IBM Research Division, Thomas J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598, USA
  • fYear
    1996
  • fDate
    9-11 Sept. 1996
  • Firstpage
    813
  • Lastpage
    820
  • Abstract
    Twenty years after the first application of the Monte Carlo method to the study of electron transport in Si, we discuss the evolution of the physical models employed, from the early parabolic-band models of the mid-1970s to the ab-initio full-band simulations of the 1990s. We note that only recently we have reached a satisfactory understanding of the basic scattering mechanisms at high energy. We sketch the reasons for this embarrassing delay, and present the new `standard model´ arising from this recent progress.
  • Keywords
    Delay; Electrons; Impact ionization; Irrigation; Kinetic energy; Microscopy; Monte Carlo methods; Phonons; Scattering; Uncertainty;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1996. ESSDERC '96. Proceedings of the 26th European
  • Conference_Location
    Bologna, Italy
  • Print_ISBN
    286332196X
  • Type

    conf

  • Filename
    5435986