DocumentCode
513719
Title
Monte Carlo Simulation of Electron Transport in Si: The First 20 Years
Author
Fischetti, M.V. ; Laux, S.E.
Author_Institution
IBM Research Division, Thomas J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598, USA
fYear
1996
fDate
9-11 Sept. 1996
Firstpage
813
Lastpage
820
Abstract
Twenty years after the first application of the Monte Carlo method to the study of electron transport in Si, we discuss the evolution of the physical models employed, from the early parabolic-band models of the mid-1970s to the ab-initio full-band simulations of the 1990s. We note that only recently we have reached a satisfactory understanding of the basic scattering mechanisms at high energy. We sketch the reasons for this embarrassing delay, and present the new `standard model´ arising from this recent progress.
Keywords
Delay; Electrons; Impact ionization; Irrigation; Kinetic energy; Microscopy; Monte Carlo methods; Phonons; Scattering; Uncertainty;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1996. ESSDERC '96. Proceedings of the 26th European
Conference_Location
Bologna, Italy
Print_ISBN
286332196X
Type
conf
Filename
5435986
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