DocumentCode :
513733
Title :
On 1/F Noise in Polysilicon Emitter Bipolar Transistors: Coherence between Base Current Noise and Emitter Series Resistance Noise
Author :
Markus, H.A.W. ; Roche, Ph. ; Kleinpenning, T.G.M.
Author_Institution :
Eindhoven University of Technology, Department of Electrical Engineering, P.O. Box 513, 5600 MB Eindhoven, The Netherlands
fYear :
1996
fDate :
9-11 Sept. 1996
Firstpage :
787
Lastpage :
790
Abstract :
The 1/f noise in polysilicon emitter bipolar transistors is investigated The main 1/f noise source proved to be located in the oxide layer. This source causes both 1/f noise in the base current SIb and 1/f noise in the emitter series resistance Sre. The 1/f noise is ascribed to barrier height fluctuations of the oxide layer resulting in transparency fluctuations for both minority and majority carriers in the emitter, giving rise to SIb and Sre, respectively. This model predicts SIb and Sre to be correlated. Our experimental results show a correlation factor in the range of 0.3 to 0.5. The deviation from full correlation is ascribed to local inhomogeneities in the oxide layer.
Keywords :
Acoustical engineering; Bipolar transistors; Charge carrier processes; Circuits; Density measurement; Electric resistance; Electrical resistance measurement; Noise generators; Strontium; Voltage fluctuations;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1996. ESSDERC '96. Proceedings of the 26th European
Conference_Location :
Bologna, Italy
Print_ISBN :
286332196X
Type :
conf
Filename :
5436004
Link To Document :
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