DocumentCode :
513743
Title :
A Dynamic Model of Gold/Platinum Doped Devices
Author :
Valdinoci, M. ; Colalongo, L. ; Coffa, S. ; Rudan, M.
Author_Institution :
UniversitÃ\xa0 di Bologna, viale Risorgimento, 2 - 40136 Bologna, Italy
fYear :
1995
fDate :
25-27 Sept. 1995
Firstpage :
71
Lastpage :
74
Abstract :
Deep impurities like gold or platinum are extensively used in semiconductor technology to improve the switching characteristics of the devices by decreasing the carrier lifetimes. This, on the other hand, has the undesired effect of increasing the material resistivity. Here a complete model is presented, describing the effects of gold/platinum doping on both the steady-state and transient characteristics. While in steady-state the deep-impurity effects are accounted for by simply redefining the generation-recombination rate, in transient conditions two more continuity equations are necessary to account for the dynamic variation of the charge trapped by the deep levels. Such model is applied here to predict the switching of a platinum-doped diode and the increase in the bulk material resistivity, and shows good agreement with experimental results.
Keywords :
Charge carrier lifetime; Conductivity; Equations; Gold; Platinum; Semiconductor device doping; Semiconductor impurities; Semiconductor materials; Semiconductor process modeling; Steady-state;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1995. ESSDERC '95. Proceedings of the 25th European
Conference_Location :
The Hague, The Netherlands
Print_ISBN :
286332182X
Type :
conf
Filename :
5436014
Link To Document :
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