Title :
Mechanical Stress in and Surrounding CoSi2 and TiSi2 Lines
Author :
De Wolf, Ingrid ; Howard, David J. ; Maex, Karen ; Maes, Herman E.
Author_Institution :
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
Abstract :
In this paper, the local mechanical stress near arrays of silicide lines with different thicknesses, widths, and pitches is studied using micro-Raman spectroscopy. Different silicides are compared: CoSi, CoSi2, CoSi2 formed with Ti cap, CoSi2 formed with Ti interlayer, C49 TiSi2 and C54 TiSi2. The local phase of the latter two samples was also determined by Raman spectroscopy.
Keywords :
Compressive stress; Diodes; Frequency; Mechanical variables measurement; Raman scattering; Silicidation; Spectroscopy; Stress measurement; Substrates; Tensile stress;
Conference_Titel :
Solid State Device Research Conference, 1996. ESSDERC '96. Proceedings of the 26th European
Conference_Location :
Bologna, Italy
