DocumentCode
513888
Title
Optimization of DMOS Cell Structures with a Self-Aligned Source Contact for Smart Power Applications by Realistic Numerical Device Simulation
Author
Soppa, W. ; Kanert, W. ; Heift, K.
Author_Institution
Semiconductor Group, SIEMENS AG, Balanstr. 73, D-8000 Munich 80, Germany
fYear
1991
fDate
16-19 Sept. 1991
Firstpage
69
Lastpage
72
Abstract
For the efficient application of a self-aligned source contact concept the optimization of a DMOSFET cell with respect to the specific on-resistance and voltage blocking capability has been carried out by numerical device simulations. It is shown that, in order to get appropriate predictions of the device characteristics, it is essential to consider rotational symmetry. Especially for small contact sizes, realistic contacts and doping profiles resulting from three-dimensional calculations have been taken into account.
Keywords
Contacts; Doping profiles; Geometry; Microelectronics; Numerical simulation; Power engineering and energy; Predictive models; Size measurement; Solid modeling; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location
Montreux, Switzerland
Print_ISBN
0444890661
Type
conf
Filename
5436248
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