DocumentCode :
513888
Title :
Optimization of DMOS Cell Structures with a Self-Aligned Source Contact for Smart Power Applications by Realistic Numerical Device Simulation
Author :
Soppa, W. ; Kanert, W. ; Heift, K.
Author_Institution :
Semiconductor Group, SIEMENS AG, Balanstr. 73, D-8000 Munich 80, Germany
fYear :
1991
fDate :
16-19 Sept. 1991
Firstpage :
69
Lastpage :
72
Abstract :
For the efficient application of a self-aligned source contact concept the optimization of a DMOSFET cell with respect to the specific on-resistance and voltage blocking capability has been carried out by numerical device simulations. It is shown that, in order to get appropriate predictions of the device characteristics, it is essential to consider rotational symmetry. Especially for small contact sizes, realistic contacts and doping profiles resulting from three-dimensional calculations have been taken into account.
Keywords :
Contacts; Doping profiles; Geometry; Microelectronics; Numerical simulation; Power engineering and energy; Predictive models; Size measurement; Solid modeling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location :
Montreux, Switzerland
Print_ISBN :
0444890661
Type :
conf
Filename :
5436248
Link To Document :
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