• DocumentCode
    513888
  • Title

    Optimization of DMOS Cell Structures with a Self-Aligned Source Contact for Smart Power Applications by Realistic Numerical Device Simulation

  • Author

    Soppa, W. ; Kanert, W. ; Heift, K.

  • Author_Institution
    Semiconductor Group, SIEMENS AG, Balanstr. 73, D-8000 Munich 80, Germany
  • fYear
    1991
  • fDate
    16-19 Sept. 1991
  • Firstpage
    69
  • Lastpage
    72
  • Abstract
    For the efficient application of a self-aligned source contact concept the optimization of a DMOSFET cell with respect to the specific on-resistance and voltage blocking capability has been carried out by numerical device simulations. It is shown that, in order to get appropriate predictions of the device characteristics, it is essential to consider rotational symmetry. Especially for small contact sizes, realistic contacts and doping profiles resulting from three-dimensional calculations have been taken into account.
  • Keywords
    Contacts; Doping profiles; Geometry; Microelectronics; Numerical simulation; Power engineering and energy; Predictive models; Size measurement; Solid modeling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
  • Conference_Location
    Montreux, Switzerland
  • Print_ISBN
    0444890661
  • Type

    conf

  • Filename
    5436248