DocumentCode :
513893
Title :
Nonstationary Electron Transport in Realistic Submicron BP-SAINT GaAs MESFETs Evaluated by Ensemble Monte Carlo Simulation
Author :
Yamada, Y.
Author_Institution :
Department of Electrical Engineering and Computer Science, Kumamoto University, Kurokami 2-39-1, Kumamoto City 860, JAPAN
fYear :
1991
fDate :
16-19 Sept. 1991
Firstpage :
45
Lastpage :
48
Abstract :
The nonstationary electron transport in the realistic nonuniformly-doped BPSAINT GaAs MESFETs with 0.1 to 0.53¿m gate-lengths has been studied under the various conditions using an ensemble Monte Carlo simulator. It is found that the effective saturation velocity depends on the gate-length, but also on the drain voltage, the gate voltage, and the doping density. The some assumptions used in the relaxation time approximation are discussed.
Keywords :
Cities and towns; Computational modeling; Computer simulation; Doping; Electrons; Gallium arsenide; MESFETs; Microelectronics; Monte Carlo methods; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location :
Montreux, Switzerland
Print_ISBN :
0444890661
Type :
conf
Filename :
5436254
Link To Document :
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