• DocumentCode
    513921
  • Title

    Performance of AlGaAs/GaAs heterostructure bipolar transistors grown by MOVPE

  • Author

    Willen, B ; Haga, D ; Landgren, G.

  • Author_Institution
    Swedish Institute of Microelectronics, P.O. Box 1084, S-164 21 Kista, Sweden
  • fYear
    1990
  • fDate
    10-13 Sept. 1990
  • Firstpage
    485
  • Lastpage
    488
  • Abstract
    A self-aligned fabrication process for AlGaAs/GaAs heterostructure bipolar transistors grown by metal-organic vapor phase epitaxy has been developed. A DC-amplification of 500 has been achieved on large area devices and a maximum frequency of oscillation, fmax, of more than 30 GHz has been obtained for devices with two stripes of 2.5×10 ¿m emitter area. We have also characterized the intrinsic and extinsic time constants and outlined future device optimization expected to improve the performance into the 60 GHz range.
  • Keywords
    Bipolar transistors; Doping; Epitaxial growth; Epitaxial layers; Gallium arsenide; Gold; Heterojunction bipolar transistors; Molecular beam epitaxial growth; Temperature; Zinc;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
  • Conference_Location
    Nottingham, England
  • Print_ISBN
    0750300655
  • Type

    conf

  • Filename
    5436310