DocumentCode :
513921
Title :
Performance of AlGaAs/GaAs heterostructure bipolar transistors grown by MOVPE
Author :
Willen, B ; Haga, D ; Landgren, G.
Author_Institution :
Swedish Institute of Microelectronics, P.O. Box 1084, S-164 21 Kista, Sweden
fYear :
1990
fDate :
10-13 Sept. 1990
Firstpage :
485
Lastpage :
488
Abstract :
A self-aligned fabrication process for AlGaAs/GaAs heterostructure bipolar transistors grown by metal-organic vapor phase epitaxy has been developed. A DC-amplification of 500 has been achieved on large area devices and a maximum frequency of oscillation, fmax, of more than 30 GHz has been obtained for devices with two stripes of 2.5×10 ¿m emitter area. We have also characterized the intrinsic and extinsic time constants and outlined future device optimization expected to improve the performance into the 60 GHz range.
Keywords :
Bipolar transistors; Doping; Epitaxial growth; Epitaxial layers; Gallium arsenide; Gold; Heterojunction bipolar transistors; Molecular beam epitaxial growth; Temperature; Zinc;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location :
Nottingham, England
Print_ISBN :
0750300655
Type :
conf
Filename :
5436310
Link To Document :
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