DocumentCode
513921
Title
Performance of AlGaAs/GaAs heterostructure bipolar transistors grown by MOVPE
Author
Willen, B ; Haga, D ; Landgren, G.
Author_Institution
Swedish Institute of Microelectronics, P.O. Box 1084, S-164 21 Kista, Sweden
fYear
1990
fDate
10-13 Sept. 1990
Firstpage
485
Lastpage
488
Abstract
A self-aligned fabrication process for AlGaAs/GaAs heterostructure bipolar transistors grown by metal-organic vapor phase epitaxy has been developed. A DC-amplification of 500 has been achieved on large area devices and a maximum frequency of oscillation, fmax , of more than 30 GHz has been obtained for devices with two stripes of 2.5Ã10 ¿m emitter area. We have also characterized the intrinsic and extinsic time constants and outlined future device optimization expected to improve the performance into the 60 GHz range.
Keywords
Bipolar transistors; Doping; Epitaxial growth; Epitaxial layers; Gallium arsenide; Gold; Heterojunction bipolar transistors; Molecular beam epitaxial growth; Temperature; Zinc;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location
Nottingham, England
Print_ISBN
0750300655
Type
conf
Filename
5436310
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