• DocumentCode
    513946
  • Title

    Influence of Top Oxide Thickness on Electrical Properties of ONO Stacked Insulators

  • Author

    Reisinger, H. ; Spitzer, A.

  • Author_Institution
    Siemens AG, Otto Hahn Ring 6, D-8000 Mÿnchen 83, Federal Republic of Germany
  • fYear
    1989
  • fDate
    11-14 Sept. 1989
  • Firstpage
    545
  • Lastpage
    548
  • Keywords
    Capacitors; Current density; Current measurement; Density measurement; Dielectrics and electrical insulation; Electron traps; Oxidation; Random access memory; Tunneling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
  • Conference_Location
    Berlin, Germany
  • Print_ISBN
    0387510001
  • Type

    conf

  • Filename
    5436546
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=513946