Title :
A Study of Ultra Shallow Junctions by Diffusion from Self-aligned Silicides
Author :
Jiang, H. ; Osburn, C.M. ; Xiao, Z-G. ; Smith, P. ; McGuire, G. ; Rozgonyi, G.A.
Author_Institution :
Dept. of Electrical and Computer Engineering, North Carolina State University, Raleigh, NC 27695-7911, USA; The Royal Institute of Technology, Electrum, Solid State Electronics, S-16428, Kista, Sweden
Keywords :
Annealing; Boron; Electric variables measurement; Loss measurement; Materials science and technology; Silicides; Silicon; Thermal engineering; Thermal resistance; Thermal stability;
Conference_Titel :
Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
Conference_Location :
Berlin, Germany
