DocumentCode
514003
Title
A Study of Ultra Shallow Junctions by Diffusion from Self-aligned Silicides
Author
Jiang, H. ; Osburn, C.M. ; Xiao, Z-G. ; Smith, P. ; McGuire, G. ; Rozgonyi, G.A.
Author_Institution
Dept. of Electrical and Computer Engineering, North Carolina State University, Raleigh, NC 27695-7911, USA; The Royal Institute of Technology, Electrum, Solid State Electronics, S-16428, Kista, Sweden
fYear
1989
fDate
11-14 Sept. 1989
Firstpage
241
Lastpage
247
Keywords
Annealing; Boron; Electric variables measurement; Loss measurement; Materials science and technology; Silicides; Silicon; Thermal engineering; Thermal resistance; Thermal stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
Conference_Location
Berlin, Germany
Print_ISBN
0387510001
Type
conf
Filename
5436620
Link To Document