DocumentCode
514050
Title
Deep Submicron Dry Etching
Author
Laporte, Ph.
Author_Institution
LETI, a division of Commisariat á l´´Energie Atomique, CENG 85X-38041 GRENOBLE CEDEX FRANCE
fYear
1989
fDate
11-14 Sept. 1989
Firstpage
13
Lastpage
22
Keywords
Anisotropic magnetoresistance; Costs; Dry etching; Inductors; Laboratories; Manufacturing; Plasma applications; Plasma devices; Plasma materials processing; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
Conference_Location
Berlin, Germany
Print_ISBN
0387510001
Type
conf
Filename
5436678
Link To Document