Title :
Development of CMOS Compatible P-Channel Junction-Field-Effect Transistors for Very Low Noise Applications
Author :
Stuch, D. ; Skapa, H. ; Vogt, H. ; Zimmer, G.
Author_Institution :
Fraunhofer-Institute for Microelectronic Circuits and Systems, D-4100 Duisburg, FRG
Abstract :
CMOS compatible Junction-Field-Effect-Transistors (JFETs) for very low noise applications with different transistor layouts have been developed and tested. The l/f-corner frequency is below 1 kHz. An equivalent noise voltage density of 1 nV/HZ at 100 kHz was achieved. The transistors were applied as discrete elements in the inputstage of a transimpedance amplifier for plumbicon tubes. A total signal to noise ratio of 55 dB has been measured.
Keywords :
Boron; Circuit noise; Circuit testing; JFETs; MOSFETs; Metallization; Ohmic contacts; Tin; Transconductance; Very large scale integration;
Conference_Titel :
Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
Conference_Location :
Bologna, Italy