DocumentCode
514088
Title
Scanning of the Entire Energy Gap at the SI-SiO2 Interface in Mosfets using the Conductance Technique: Comparison with Dynamic Transconductance Measurements
Author
Haddara, Hisham ; El-Sayed, Mohamed
Author_Institution
Laboratoire de Physique des Composants Ã\xa0 Semiconducteurs, ENSERG, 23 rue des Martyrs, 38031 Grenoble Cedex, France.
fYear
1987
fDate
14-17 Sept. 1987
Firstpage
695
Lastpage
698
Abstract
A new and accurate approach to ac conductance measurements on MOSFETs is presented. It is shown that the conductance technique can be used to study interface trap properties in the entire silicon band-gap by direct measurement on a single MOSFET. Moreover, the validity of the dynamic transcnductance method is assessed by comparing its results with those obtained from conductance measurements on the same devices.
Keywords
Electrical resistance measurement; Energy measurement; Equivalent circuits; Frequency measurement; Length measurement; MOSFETs; Photonic band gap; Silicon; Time measurement; Transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
Conference_Location
Bologna, Italy
Print_ISBN
0444704779
Type
conf
Filename
5436735
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