DocumentCode :
516360
Title :
New Developments in Gigabit Electronics
Author :
Livingstone, Alec
Author_Institution :
British Telecom Research Labs, Martlesham Heath, Ipswich, IP5 7RE.
fYear :
1984
fDate :
0-0 Sept. 1984
Firstpage :
218
Lastpage :
225
Abstract :
This review of gigabit electronics is particularly timely. For several years GaAs has been seen as the front-runner of the research effort in the subject. Now, commercial GaAs circuits operating at above 1Gbit/s are available and the material has matured to the point where accurate circuit design can begin to achieve the performance benefits predicted for the material. The heralded performance benefits over Si have never fully been realised although there is a threefold margin of performance currently being achieved. In an attempt to extend the margin new materials and structures are being examined, particularly those made possible by the new epitaxial processes, MBE and MOVPE. The potential of these new structures will be discussed and comparisons will be made between circuits fabricated in Si, GaAs and these advanced structures.
Keywords :
Atomic layer deposition; Circuits; Electron mobility; Epitaxial growth; Gallium arsenide; Indium phosphide; Molecular beam epitaxial growth; Optical materials; Scattering; Semiconductor materials;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference, 1984. ESSCIRC '84. Tenth European
Conference_Location :
Edinburgh, UK
Type :
conf
Filename :
5467972
Link To Document :
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