• DocumentCode
    516724
  • Title

    Compact Modelling of Submicron CMOS

  • Author

    Klaassen, D.B.M.

  • Author_Institution
    Philips Research Laboratories, Eindhoven, The Netherlands
  • fYear
    1996
  • fDate
    17-19 Sept. 1996
  • Firstpage
    40
  • Lastpage
    46
  • Abstract
    The accuracy of present-day compact MOS models and relevant benchmark criteria are reviewed. The impact on compact modelling of new CMOS applications and the rapid progress in process technology towards dimensions of 0.1 micron, will be discussed.
  • Keywords
    Application software; Benchmark testing; CMOS integrated circuits; CMOS process; CMOS technology; Integrated circuit modeling; Integrated circuit technology; Semiconductor device modeling; Solid modeling; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Circuits Conference, 1996. ESSCIRC '96. Proceedings of the 22nd European
  • Conference_Location
    Neuchatel, Switzerland
  • Print_ISBN
    2-86332-197-8
  • Type

    conf

  • Filename
    5468586