Title :
Speed Limit of Thin-Epitaxy MTL/I2L
Author :
Berger, Horst H. ; Helwig, Klaus
Author_Institution :
IBM Labs., Boblingen, Germany
Abstract :
The various speed limiting influences in conventional MTL devices are investigated. Even with thin epitaxy, charge storage in the npn part remains the main speed detractor. Hence, the npn part should be improved firstly, e.g. using polysilicon techniques.
Keywords :
integrated injection logic; MTL devices; charge storage; polysilicon techniques; speed detractor; thin-epitaxy NTL/I2L speed limit; Capacitance; Computer simulation; Delay; Electronic switching systems; Epitaxial growth; Impurities; Photonic band gap; Process control; Silicon; Strips;
Conference_Titel :
Solid State Circuits Conference - Digest of Technical Papers, 1978. ESSCIRC 78. 4th European
Conference_Location :
Amsterdam
