• DocumentCode
    517013
  • Title

    Speed Limit of Thin-Epitaxy MTL/I2L

  • Author

    Berger, Horst H. ; Helwig, Klaus

  • Author_Institution
    IBM Labs., Boblingen, Germany
  • fYear
    1978
  • fDate
    18-21 Sept. 1978
  • Firstpage
    55
  • Lastpage
    56
  • Abstract
    The various speed limiting influences in conventional MTL devices are investigated. Even with thin epitaxy, charge storage in the npn part remains the main speed detractor. Hence, the npn part should be improved firstly, e.g. using polysilicon techniques.
  • Keywords
    integrated injection logic; MTL devices; charge storage; polysilicon techniques; speed detractor; thin-epitaxy NTL/I2L speed limit; Capacitance; Computer simulation; Delay; Electronic switching systems; Epitaxial growth; Impurities; Photonic band gap; Process control; Silicon; Strips;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Circuits Conference - Digest of Technical Papers, 1978. ESSCIRC 78. 4th European
  • Conference_Location
    Amsterdam
  • Type

    conf

  • Filename
    5469046
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=517013