DocumentCode
517081
Title
A Fully Ion Implanted Integrated Circuit Process
Author
Perkins, K.D. ; Walsh, P.S. ; Ward, P.J.
fYear
1975
fDate
2-5 Sept. 1975
Firstpage
113
Lastpage
114
Keywords
Annealing; Atomic layer deposition; Circuit synthesis; Frequency; Integrated circuit technology; Ion implantation; Resists; Semiconductor device doping; Temperature control; Temperature distribution;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Circuits Conference (ESSCIRC), 1975 First European
Conference_Location
Canterbury, UK
Print_ISBN
0-85296-149-9
Type
conf
Filename
5469128
Link To Document