DocumentCode :
517081
Title :
A Fully Ion Implanted Integrated Circuit Process
Author :
Perkins, K.D. ; Walsh, P.S. ; Ward, P.J.
fYear :
1975
fDate :
2-5 Sept. 1975
Firstpage :
113
Lastpage :
114
Keywords :
Annealing; Atomic layer deposition; Circuit synthesis; Frequency; Integrated circuit technology; Ion implantation; Resists; Semiconductor device doping; Temperature control; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Circuits Conference (ESSCIRC), 1975 First European
Conference_Location :
Canterbury, UK
Print_ISBN :
0-85296-149-9
Type :
conf
Filename :
5469128
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=517081
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