Title :
Semiconductor Technologies with Reduced Dimensions
Author :
Stein, K.-U. ; Widmann, D.
Abstract :
In the last years the complexity of integrated circuits has grown exponentially. This growth has been achieved primarily by increasing the chip area, by reducing the linewidths, and last but not least by improving devices and circuits. This paper deals with the methods and problems associated with linewidth reduction. It is the aim of the paper to present to the circuit engineer simplified models of typical results which allow him to consider these results for future circuits and assist him in his cooperation with technological engineers and device physicists.
Keywords :
circuit complexity; electron beam lithography; integrated circuit modelling; ultraviolet lithography; X-ray lithography; electron beam lithography; integrated circuit complexity; linewidth reduction; semiconductor technology; Doping; Electron beams; Electron optics; Integrated circuit technology; Optical beams; Optical device fabrication; Plasma applications; Resists; Semiconductor process modeling; Wet etching;
Conference_Titel :
Solid State Circuits Conference, 1976. ESSCIRC 76. 2nd European
Conference_Location :
Toulouse
