• DocumentCode
    517136
  • Title

    Semiconductor Technologies with Reduced Dimensions

  • Author

    Stein, K.-U. ; Widmann, D.

  • fYear
    1976
  • fDate
    21-24 Sept. 1976
  • Abstract
    In the last years the complexity of integrated circuits has grown exponentially. This growth has been achieved primarily by increasing the chip area, by reducing the linewidths, and last but not least by improving devices and circuits. This paper deals with the methods and problems associated with linewidth reduction. It is the aim of the paper to present to the circuit engineer simplified models of typical results which allow him to consider these results for future circuits and assist him in his cooperation with technological engineers and device physicists.
  • Keywords
    circuit complexity; electron beam lithography; integrated circuit modelling; ultraviolet lithography; X-ray lithography; electron beam lithography; integrated circuit complexity; linewidth reduction; semiconductor technology; Doping; Electron beams; Electron optics; Integrated circuit technology; Optical beams; Optical device fabrication; Plasma applications; Resists; Semiconductor process modeling; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Circuits Conference, 1976. ESSCIRC 76. 2nd European
  • Conference_Location
    Toulouse
  • Type

    conf

  • Filename
    5469259