Title :
Phase shifting microwave structure employing atomic layer deposited (ALD) and ferroelectric films on flexible substrates
Author :
Kotha, R. ; Elam, D. ; Chabanov, A. ; Chen, C.L. ; Ayon, A.A.
Author_Institution :
MEMS Res. Lab., San Antonio, TX, USA
Abstract :
In this work, phase shifting performance of atomic layer deposited (ALD) films and ferroelectric films had been measured on flexible substrates. ALD ZnO and PVDF/TrFe films were patterned on signal electrode of coplanar waveguide, and their phase shifting performance was collected with a Vector Network Analyzer (VNA) in combination with coplanar microwave probes between 1 GHz to 50GHz.
Keywords :
atomic layer deposition; coplanar waveguides; ferroelectric materials; ferroelectric thin films; flexible electronics; microwave circuits; microwave phase shifters; zinc compounds; ALD ZnO; PVDF/TrFe film; atomic layer deposited film; coplanar waveguide; ferroelectric film; flexible substrate; frequency 1 GHz to 50 GHz; phase shifting microwave structure; vector network analyzer; Atomic layer deposition; Atomic measurements; Coplanar waveguides; Electrodes; Ferroelectric films; Pattern analysis; Performance analysis; Phase measurement; Signal analysis; Zinc oxide;
Conference_Titel :
Design Test Integration and Packaging of MEMS/MOEMS (DTIP), 2010 Symposium on
Conference_Location :
Seville
Print_ISBN :
978-1-4244-6636-8
Electronic_ISBN :
978-2-35500-011-9
