Phase shifting microwave structure employing atomic layer deposited (ALD) and ferroelectric films on flexible substrates

Author

Kotha, R. ; Elam, D. ; Chabanov, A. ; Chen, C.L. ; Ayon, A.A.

Author_Institution

MEMS Res. Lab., San Antonio, TX, USA

fYear

2010

fDate

5-7 May 2010

Firstpage

232

Lastpage

236

Abstract

In this work, phase shifting performance of atomic layer deposited (ALD) films and ferroelectric films had been measured on flexible substrates. ALD ZnO and PVDF/TrFe films were patterned on signal electrode of coplanar waveguide, and their phase shifting performance was collected with a Vector Network Analyzer (VNA) in combination with coplanar microwave probes between 1 GHz to 50GHz.

Keywords

atomic layer deposition; coplanar waveguides; ferroelectric materials; ferroelectric thin films; flexible electronics; microwave circuits; microwave phase shifters; zinc compounds; ALD ZnO; PVDF/TrFe film; atomic layer deposited film; coplanar waveguide; ferroelectric film; flexible substrate; frequency 1 GHz to 50 GHz; phase shifting microwave structure; vector network analyzer; Atomic layer deposition; Atomic measurements; Coplanar waveguides; Electrodes; Ferroelectric films; Pattern analysis; Performance analysis; Phase measurement; Signal analysis; Zinc oxide;

fLanguage

English

Publisher

ieee

Conference_Titel

Design Test Integration and Packaging of MEMS/MOEMS (DTIP), 2010 Symposium on

Conference_Location

Seville

Print_ISBN

978-1-4244-6636-8

Electronic_ISBN

978-2-35500-011-9

Type

conf

Filename

5486510