Title :
Low-noise amplifiers in D-band using 100 nm and 50 nm mHEMT technology
Author :
Weissbrodt, E. ; Kallfass, I. ; Weber, R. ; Tessmann, A. ; Massler, H. ; Leuther, A.
Author_Institution :
Fraunhofer Inst. for Appl. Solid-State Phys. (IAF), Freiburg, Germany
Abstract :
This paper presents two low-noise amplifiers in D-band (110-170 GHz) using metamorphic high electron mobility transistor (mHEMT) technology with gate lengths of 100 nm and 50 nm for applications in passive millimeter-wave imaging. Both amplifiers consist of four transistor stages with a gate width of 2 × 15 μm, each. The chip sizes are 1.0 × 2.0 mm2. The circuit design and the impedance matching networks are described in detail and the simulations of the scattering parameters and the noise figure are compared to D-band measurements. A small signal gain of 18-21 dB over a bandwidth of 30 GHz and 20-26 dB in a narrowband design was achieved. Both amplifiers demonstrated a measured noise figure of well below 4 dB.
Keywords :
MMIC amplifiers; electromagnetic wave scattering; high electron mobility transistors; impedance matching; low noise amplifiers; millimetre wave imaging; D-band; chip size; circuit design; frequency 110 GHz to 170 GHz; frequency 30 GHz; gain 18 dB to 21 dB; gate length; impedance matching; low-noise amplifier; mHEMT technology; metamorphic high electron mobility transistor; passive millimeter-wave imaging; scattering parameter; size 100 nm; size 50 nm; transistor stage; Circuit synthesis; HEMTs; Low-noise amplifiers; MODFETs; Millimeter wave circuits; Millimeter wave technology; Millimeter wave transistors; Noise figure; Noise measurement; mHEMTs; D-band; MMIC; low-noise amplifier; mHEMT; millimeter-wave imaging;
Conference_Titel :
Microwave Conference, 2010 German
Conference_Location :
Berlin
Print_ISBN :
978-1-4244-4933-0
Electronic_ISBN :
978-3-9812668-1-8