• DocumentCode
    519974
  • Title

    Observation of ArF laser induced structural defects in highly transparent synthetic silica glass

  • Author

    Ono, M. ; Koike, A. ; Iwata, K. ; Takata, M.

  • Author_Institution
    Asahi Glass Co. Ltd., Yokohama, Japan
  • fYear
    2010
  • fDate
    16-21 May 2010
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Sensitive in-situ measurement systems for differential absorption and photoluminescence were developed to evaluate E´ center, ODC(II), and NBOHC. The change of their concentrations by ArF irradiation were successfully observed in highly transparent synthetic silica glass.
  • Keywords
    argon compounds; gas lasers; glass; laser beam effects; silicon compounds; ArF; E´ center; SiO2; highly transparent synthetic silica glass; laser induced structural defect; light absorption; nonbridging hole center; oxygen deficiency center; photoluminescence; Amorphous materials; Electromagnetic wave absorption; Glass; Lamps; Optical materials; Optical scattering; Optical sensors; Photoluminescence; Semiconductor materials; Silicon compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-55752-890-2
  • Electronic_ISBN
    978-1-55752-890-2
  • Type

    conf

  • Filename
    5499532
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=519974