DocumentCode :
520260
Title :
Thickness and refractive index measurement of a wafer based on the optical comb
Author :
Jin, Jonghan ; Kim, Jae Wan ; Kim, Jong-Ahn ; Eom, Tae Bong
Author_Institution :
Div. of Phys. Metrol., Korea Res. Inst. of Stand. & Sci. (KRISS), Daejeon, South Korea
fYear :
2010
fDate :
16-21 May 2010
Firstpage :
1
Lastpage :
2
Abstract :
We suggested and demonstrated a novel method that can determine the thickness and refractive index of a wafer at the same time in a single measurement by using the optical comb. The thickness and refractive index of a wafer can be separated simply from optical thickness by using the various phase information obtained in spectral domain. For the feasibility test, the thickness and refractive index of a double side polished wafer were measured.
Keywords :
refractive index measurement; thickness measurement; optical comb; wafer refractive index measurement; wafer thickness measurement; Interference; Light sources; Optical feedback; Optical interferometry; Optical modulation; Optical refraction; Optical variables control; Refractive index; Silicon; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-890-2
Electronic_ISBN :
978-1-55752-890-2
Type :
conf
Filename :
5499829
Link To Document :
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