Title :
Fabrication of photonic crystals with sub-100 nm features using multiphoton lithography with pre-swollen resins
Author :
Chen, Vincent W. ; Jarnagin, Nathan D. ; Perry, Joseph W.
Author_Institution :
Sch. of Chem. & Biochem., Georgia Inst. of Technol., Atlanta, GA, USA
Abstract :
Pre-swelling of resins has allowed the fabrication of photonic crystals with linewidths below 100 nm using multiphoton lithography at 730 nm. The resulting polymer photonic crystals show stop-band reflectivities over 70% at ∼1.8 µm.
Keywords :
Lithography; Optical device fabrication; Optical reflection; Personal communication networks; Photonic crystals; Polymers; Reflectivity; Resins; Resists; Scanning electron microscopy;
Conference_Titel :
Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
Conference_Location :
San Jose, CA, USA
Print_ISBN :
978-1-55752-890-2
Electronic_ISBN :
978-1-55752-890-2
