Title :
Low-threshold, single-frequency distributed-feedback waveguide laser in Al2O3∶Er3+ on silicon
Author :
Bernhardi, E.H. ; van Wolferen, H.A.G.M. ; Agazzi, L. ; Khan, M.R.H. ; Roeloffzen, C.G.H. ; Wörhoff, K. ; Pollnau, M. ; de Ridder, R.M.
Author_Institution :
Integrated Opt. Microsyst. Group, Univ. of Twente, Enschede, Netherlands
Abstract :
Single-frequency distributed-feedback lasing with 165 μW output power at 1538.8 nm is realized in Al2O3:Er3+ waveguides fabricated on silicon wafers. Distributed feedback is provided by a surface relief Bragg grating fabricated with laser interference lithography.
Keywords :
aluminium compounds; distributed feedback lasers; erbium; optical fabrication; silicon; solid lasers; Al2O3:Er3+; laser interference lithography; low threshold single-frequency distributed-feedback waveguide laser; optical fabrication; power 165 muW; silicon wafers; surface relief Bragg grating; wavelength 1538.8 nm; Bragg gratings; Distributed feedback devices; Erbium; Interference; Laser feedback; Lithography; Power generation; Silicon; Surface emitting lasers; Waveguide lasers;
Conference_Titel :
Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-890-2
Electronic_ISBN :
978-1-55752-890-2
