• DocumentCode
    521350
  • Title

    3D AFM characterization of the edge roughness of silicon high Q resonators

  • Author

    Schiavone, P. ; Martin, M. ; Alipour, P. ; Eftekhar, A. ; Yegnanarayanan, S. ; Adibi, A.

  • Author_Institution
    UMI 2958 Georgia Tech-CNRS, Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2010
  • fDate
    16-21 May 2010
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Nanophotonic resonators are very sensitive to sidewall roughness. We investigate in detail the sidewall roughness, correlation length and fractal roughness exponent for high Q silicon resonators using a 3D AFM
  • Keywords
    Atomic force microscopy; Data mining; Fractals; Instruments; Optical resonators; Optical surface waves; Rough surfaces; Scanning electron microscopy; Silicon; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
  • Conference_Location
    San Jose, CA, USA
  • Print_ISBN
    978-1-55752-890-2
  • Electronic_ISBN
    978-1-55752-890-2
  • Type

    conf

  • Filename
    5500967
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=521350