Title :
Resolution Improvement by Focusing into Saturable Kerr Nonlinear Media
Author :
Gao, Xingyu ; Liu, Shugui ; Gan, Xiaosong
Author_Institution :
State Key Lab. of Precision Meas. Technol. & Instrum., Tianjin Univ., Tianjin, China
Abstract :
Influence of Kerr nonlinear effect on the optical properties of a focal spot is one of the problems in nano-lithography. In this paper, the process of focusing into saturable Kerr-type nonlinear media is investigated using FDTD method with an exponential saturation nonlinear model. Simulation results show that radial polarized focal beam performs better transverse resolution improvement than the linear polarized focal beam. The reasons for this phenomenon are due to the different electric field distributions of both polarization focal beams, and the enhancement of longitudinal electric components by self-focusing effect.
Keywords :
finite difference time-domain analysis; nanolithography; optical Kerr effect; photolithography; electric field distributions; exponential saturation nonlinear model; focal spot; linear polarized focal beam; nanolithography; radial polarized focal beam; resolution improvement; saturable Kerr nonlinear media; self-focusing effect; Finite difference methods; Nonlinear optics; Optical mixing; Optical modulation; Optical refraction; Optical saturation; Optical variables control; Polarization; Time domain analysis; Ultrafast optics;
Conference_Titel :
Photonics and Optoelectronic (SOPO), 2010 Symposium on
Conference_Location :
Chengdu
Print_ISBN :
978-1-4244-4963-7
Electronic_ISBN :
978-1-4244-4964-4
DOI :
10.1109/SOPO.2010.5504062
