Title :
Nanotechnology for low-power and high-speed nanoelectronics applications
Author_Institution :
Intel Corporation
Abstract :
No abstract available
Keywords :
Engineering profession; High K dielectric materials; High-K gate dielectrics; Manufacturing; Microprocessors; Nanoelectronics; Nanotechnology; Research and development; Silicon; Transistors; keynote;
Conference_Titel :
Low Power Electronics and Design (ISLPED), 2007 ACM/IEEE International Symposium on
Conference_Location :
Portland, OR, USA
Electronic_ISBN :
978-1-59593-709-4
DOI :
10.1145/1283780.1283781
